| 摘要 |
An ultrasonic cleaning device ( 50 ) comprises: an ultrasonic oscillation plate ( 2 ) having a plurality of ultrasonic oscillators ( 1 ); an ultrasonic wave guide chamber ( 3 ) for collecting an ultrasonic wave force generated by the ultrasonic oscillation plate; and a cleaning tank ( 4 ) in which a cleaning solution ( 20 ) is stored, wherein an object ( 5 ) to be cleaned is cleaned when it is dipped in the cleaning tank. Since an upper portion of the ultrasonic wave guide chamber is airtightly closed with the upper face ( 31 ) and formed into a bowl shape, an air layer ( 10 ) is formed between a liquid level of the cleaning solution in the ultrasonic wave guide chamber and the upper face ( 31 ). The cleaning tank is joined to the ultrasonic wave guide chamber, and an ultrasonic oscillation plate is arranged so that it can be opposed to the ultrasonic wave guide chamber.
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