发明名称 |
Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern |
摘要 |
There is provided a means for forming a protective film of a fluorine-containing polymer composition excellent in smoothness and adhesiveness on a photoresist. Moreover, there is provided a means for removing the protective film without impairing the underlying photoresist. A polymer coating composition obtainable by dissolving a fluorine-containing polymer compound in a solvent comprising a fluorinated acetal having a specific structure is applied on a photoresist and dried to form a protective film. The fluorinated acetal having the specific structure is suitable as a solvent for being brought into contact with a fluorine-containing polymer film, peeling the film, and forming a photoresist or a lithographic pattern.
|
申请公布号 |
US2007105044(A1) |
申请公布日期 |
2007.05.10 |
申请号 |
US20060591548 |
申请日期 |
2006.11.02 |
申请人 |
CENTRAL GLASS COMPANY, LIMITED |
发明人 |
MAEDA KAZUHIKO;OTANI MITSUTAKA;KOMORIYA HARUHIKO;KOMATA TAKEO;AKIBA SHINYA |
分类号 |
G03C1/00 |
主分类号 |
G03C1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|