发明名称 APPARATUS FOR PROCESSING SUBSTRATE, ALIGNER, AND PROCESS FOR FABRICATING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an apparatus for processing a substrate in order to fabricate a device having a desired performance. <P>SOLUTION: The apparatus T for processing the substrate is equipped with a device 60 generating a flexure traveling wave for moving a foreign matter adhering to a substrate P for fabricating a device. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007115942(A) 申请公布日期 2007.05.10
申请号 JP20050306781 申请日期 2005.10.21
申请人 NIKON CORP 发明人 OKITA SHINICHI
分类号 H01L21/027;H01L21/304 主分类号 H01L21/027
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