发明名称 NONVOLATILE MEMORY ELEMENT COMPRISING NANO DOT AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile memory element comprising a nano dot and a method for manufacturing the same. SOLUTION: The memory element comprises an oxide layer formed by a resistance-transformed substance, a lower electrode, an oxide layer formed on the lower electrode including a transition metal oxide, nano-dots formed in the oxide layer and integrating the current paths in the oxide layer into a single unit, and an upper layer formed on the oxide layer. Consequently, it is possible to stabilize a reset current by integrating the current paths in the oxide layer into a single unit. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007116166(A) 申请公布日期 2007.05.10
申请号 JP20060285165 申请日期 2006.10.19
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 PARK SANG-JIN;LEE MYOUNG-JAE;CHA YOUNG-KWAN;SEO SUN-AE;CHO KYUNG-SANG;SETSU KOSHU
分类号 H01L27/10 主分类号 H01L27/10
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