发明名称 Apparatus for treating substrates with phosphoric acid solution and method for regenerating the phosphoric acid solution employed therein
摘要 An apparatus and method for removing silicate from a phosphoric acid solution, including a treating unit, a regeneration line coupled to the treating unit, an additive solution supply member in communication with the regeneration line to decrease the temperature of the phosphoric acid solution and the concentration of the phosphoric acid therein, a filter in communication with the regeneration line to remove precipitated silicate particles, and a heating member having a heater and a vaporizing chamber to remove the additive.
申请公布号 US2007102023(A1) 申请公布日期 2007.05.10
申请号 US20060594755 申请日期 2006.11.09
申请人 YI HUN-JUNG;BYUN BYUNG-KWANG;KIM GYUNG-SOO;WOO JAI-YOUNG;HWANG DONG-WON;CHAE SEUNG-KI;LEE YANG-KOO;KIM SANG-HEE;PARK YOUNG-HWAN 发明人 YI HUN-JUNG;BYUN BYUNG-KWANG;KIM GYUNG-SOO;WOO JAI-YOUNG;HWANG DONG-WON;CHAE SEUNG-KI;LEE YANG-KOO;KIM SANG-HEE;PARK YOUNG-HWAN
分类号 B08B7/04;B08B3/00 主分类号 B08B7/04
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