发明名称 METHOD OF MANUFACTURING NITRIDE SEMICONDUCTOR ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a light-emitting element, which uses a nitride semiconductor substrate consisting of a nitride semiconductor film having a good crystallizability and is formed with an electrode on its rear surface, and to provide a nitride semiconductor element such as a light-receiving element. SOLUTION: A nitride semiconductor substrate is obtained by growing a nitride semiconductor film in a film thickness of 100 μm or thicker on a substrate consisting of a material different from the nitride semiconductor film, and by removing the obtained substrate from the nitride semiconductor film. The surface of the semiconductor substrate is grown into a surface polished until the difference between the recesses and projections of the surface of the semiconductor substrate is reduced to ±1 μm or smaller. The irregularity of the surface is prefered to be ±0.5 μm or smaller. The semiconductor substrate is doped with n-type impurities.
申请公布号 JP2002261014(A) 申请公布日期 2002.09.13
申请号 JP20010363030 申请日期 2001.11.28
申请人 NICHIA CHEM IND LTD 发明人 OZAKI NORIYA;NAKAMURA SHUJI
分类号 C30B29/38;H01L21/20;H01L21/205;H01L33/06;H01L33/12;H01L33/22;H01L33/32;H01L33/40 主分类号 C30B29/38
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