A method is disclosed for depositing a layer onto a substrate, including heating an evaporator to a temperature capable of completely evaporating the evaporant to be deposited; dispensing into the evaporator one or more quantized units of the evaporant that completely vaporizes; introducing a flow of a carrier gas into the evaporator before, during, or after vaporization of the evaporant so as to cause a flow of the mixture of the carrier gas and the vapor of the evaporant; and directing the flow of the mixture onto the surface of the substrate to form the layer.
申请公布号
WO2007053532(A2)
申请公布日期
2007.05.10
申请号
WO2006US42256
申请日期
2006.10.27
申请人
EASTMAN KODAK COMPANY;TYAN, YUAN-SHENG;LONG, MICHAEL;PHELAN, GIANA MARIE;CUSHMAN, THOMAS RICHARD
发明人
TYAN, YUAN-SHENG;LONG, MICHAEL;PHELAN, GIANA MARIE;CUSHMAN, THOMAS RICHARD