HIGH STRAIN GLASS/GLASS-CERAMIC CONTAINING SEMICONDUCTOR-ON-INSULATOR STRUCTURES
摘要
The present invention relates to semiconductor-on-insulator structures having strained semiconductor layers According to one embodiment of the invention, a semiconductor-on- insulator structure has a first layer including a semiconductor material (110), attached to a second layer including a glass or glass-ceramic (120), with the strain point of the glass or glass-ceramic equal to or greater than about 8000C.
申请公布号
WO2006023594(A3)
申请公布日期
2007.05.10
申请号
WO2005US29314
申请日期
2005.08.17
申请人
CORNING INCORPORATED;AITKEN, BRUCE G;DEJNEKA, MATTHEW J;GADKAREE, KISHOR P;PINCKNEY, LINDA R
发明人
AITKEN, BRUCE G;DEJNEKA, MATTHEW J;GADKAREE, KISHOR P;PINCKNEY, LINDA R