发明名称 HIGH STRAIN GLASS/GLASS-CERAMIC CONTAINING SEMICONDUCTOR-ON-INSULATOR STRUCTURES
摘要 The present invention relates to semiconductor-on-insulator structures having strained semiconductor layers According to one embodiment of the invention, a semiconductor-on- insulator structure has a first layer including a semiconductor material (110), attached to a second layer including a glass or glass-ceramic (120), with the strain point of the glass or glass-ceramic equal to or greater than about 8000C.
申请公布号 WO2006023594(A3) 申请公布日期 2007.05.10
申请号 WO2005US29314 申请日期 2005.08.17
申请人 CORNING INCORPORATED;AITKEN, BRUCE G;DEJNEKA, MATTHEW J;GADKAREE, KISHOR P;PINCKNEY, LINDA R 发明人 AITKEN, BRUCE G;DEJNEKA, MATTHEW J;GADKAREE, KISHOR P;PINCKNEY, LINDA R
分类号 H01L27/01;H01L23/58 主分类号 H01L27/01
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