DIFFRACTION OPTICAL ELEMENT, PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To form a pattern with a stable interference exposed light by a simple apparatus.

SOLUTION: A pattern forming apparatus 100 includes a laser oscillator 101 and a diffraction optical element 200 which receives the oscillated beam incident from the laser oscillator 101 to produce a plurality of diffraction beams, and forms a pattern on a substrate 300 by performing an interference exposure with diffraction beams. The diffraction optical element 200 produces ±first-order diffraction beams of equivalent strength and zero-order diffraction beams of strength less than the ±first-order diffraction beams, and the interference exposure is performed according to an interference light-strength distribution which is formed just after the diffraction optical element 200 by interference of the ±first-order diffraction beams.

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