发明名称 Radiation shield for cryogenic pump for high temperature physical vapor deposition
摘要 A method and apparatus to shield a cryogenic pump in a physical vapor deposition chamber comprising a physical vapor deposition chamber, a gasket in thermal contact with the physical vapor deposition chamber, at least one post in contact with the gasket, a radiation shield connected at the top of the post, and at least one intermediate ring in contact with the post. A method and apparatus for a radiation shield for a cryogenic pump comprising a cryogenic pump with a region upstream from the cryogenic pump, a gasket in thermal contact the region upstream from the cryogenic pump, at least one post in contact with the gasket, a radiation shield connected at the top of the post, and at least one intermediate ring in contact with the post.
申请公布号 US2007101733(A1) 申请公布日期 2007.05.10
申请号 US20050267058 申请日期 2005.11.04
申请人 RITCHIE ALAN A 发明人 RITCHIE ALAN A.
分类号 B01D8/00 主分类号 B01D8/00
代理机构 代理人
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