| 摘要 |
A lithographic apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to hold a patterning device, the patterning device serving to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate and a fluid supply system configured to provide a fluid to a volume, the volume comprising at least a portion of the projection system, at least a portion of the illumination system, or both. The apparatus also includes a coupling device configured to couple the fluid supply system to the substrate table, substrate, support structure, patterning device, or any combination thereof.
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