REACTIVE SPUTTER DEPOSITION PROCESSES AND EQUIPMENT
摘要
The invention is a method for obtaining a reactive sputtering process with a reduced or eliminated hysteresis behavior. This is achieved by employing a target made from a mixture of metal and compound materials. In the method according to the present invention, the fraction of compound material is large enough to eliminate or significantly reduce the hysteresis behavior of the reactive sputtering process and enable a stable deposition of compound films at a rate significantly higher than what is possible from a target completely made from compound material.
申请公布号
WO2007053586(A2)
申请公布日期
2007.05.10
申请号
WO2006US42391
申请日期
2006.10.31
申请人
CARDINAL CG COMPANY;HARTIG, KLAUS;BERG, SOREN;NYBERG, TOMAS