| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a projection exposure apparatus that can form adjoining conductor patterns in an equidistant layout on a film even when an alignment mark formed on the film is displaced from an originally assumed position. <P>SOLUTION: The relative positional relation between the position of a reticle reference mark and the position of a photoreceptor reference mark is kept before and after the photoreceptor is intermittently moved. <P>COPYRIGHT: (C)2007,JPO&INPIT |
