发明名称 PUMPING SYSTEM FOR ATOMIC LAYER DEPOSITION
摘要 <p>A pumping apparatus for evacuating a reactant from a reactive region includes a vacuum able chamber, a hearth for supporting a workpiece, one or more gas introduction valves, one or more exhaust evacuation valves, and an adjustable valve providing one or more pathways there through formed by alignment of separate components of the valve, the components perforated with two or more openings to form the pathways.</p>
申请公布号 WO2007053607(A2) 申请公布日期 2007.05.10
申请号 WO2006US42451 申请日期 2006.10.31
申请人 GALEWSKI, CARL, JOHAN 发明人 GALEWSKI, CARL, JOHAN
分类号 F17D1/00;C23C16/00;H01L21/306 主分类号 F17D1/00
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