发明名称 |
CURABLE COMPOSITION, INK COMPOSITION, INKJET RECORDING METHOD, PRINTED PRODUCT, METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE AND LITHOGRAPHIC PRINTING PLATE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a curable composition highly sensitively curable by the irradiation with radioactive rays, and capable of being formed into a film having a high strength. <P>SOLUTION: The curable composition contains a compound having one cyclic ether-containing partial structure containing a cyclic ether having four or more members and represented by general formula (I), and a partial structure represented by general formula (II) [wherein, R<SP>2</SP>is an alkylene group, a cycloalkylene group or an arylene group; and n is an integer of 1-8]. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007112978(A) |
申请公布日期 |
2007.05.10 |
申请号 |
JP20060222616 |
申请日期 |
2006.08.17 |
申请人 |
FUJIFILM CORP |
发明人 |
WATANABE KOTARO |
分类号 |
C08G65/22;B41C1/10;B41J2/01;B41M5/00;C09D11/00;C09D11/322;C09D11/326;C09D11/38 |
主分类号 |
C08G65/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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