A lithographic apparatus is disclosed that includes an imprint template and a radiation source configured to cure photosensitive material, the radiation source including a laser or a light emitting diode. An imprint template is also disclosed.
申请公布号
US2007104813(A1)
申请公布日期
2007.05.10
申请号
US20060592335
申请日期
2006.11.03
申请人
ASML NETHERLANDS B.V.
发明人
WUISTER SANDER F.;KOLESNYCHENKO ALEKSEY Y.;DIJKSMAN JOHAN F.;KRUIJT-STEGEMAN YVONNE W.;SCHRAM IVAR
