Analytical apparatus, processing apparatus, measuring and/or inspecting apparatus, exposure apparatus, substrate processing system, analytical method, and program

摘要

A line width of a pattern on a substrate that is exposed and developed in an exposure apparatus is measured by a measuring instrument. In the case the line width is judged to be abnormal (step 303 ), an analytical apparatus specifies an apparatus that causes a line width variation factor (step 307 ) based on a degree of coincidence between an actual measurement value and a simulation value of the line width, specifies a line width variation factor based on a statistical value (step 311 ), optimizes parameters (steps 315 and 317 ) or the like. With these operations, the yield in device manufacturing processes improves.