| 摘要 |
PROBLEM TO BE SOLVED: To prevent the vibration and/or oscillation of a scanning type exposure apparatus in which a reticle stage and a wafer stage are scanned simultaneously. SOLUTION: A drive unit of a reticle stage 73 comprises a pair of acceleration/deceleration linear motors A<SB>4</SB>, A<SB>5</SB>and a sub-linear motor A<SB>6</SB>for constant speed scanning, wherein stators 74 and 75 of the linear motors A<SB>4</SB>and A<SB>5</SB>are fixed to a linear motor base 71b which is separated from a reticle stage base 71a which movably supports the reticle stage 73. Further, in order to cancel angular moment resulting from a difference between respective thrusts of the pair of the linear motors A<SB>4</SB>and A<SB>5</SB>, flat coils 81a, 81b for generating thrust in a vertical direction, and magnetic units 82a, 82b for preventing the oscillation are provided. COPYRIGHT: (C)2003,JPO |
