发明名称 METHOD AND APPARATUS FOR FORMING COATING FILM
摘要 PROBLEM TO BE SOLVED: To provide a method by which a coating film can be easily formed on a narrow portion of a structure, and a coating film forming apparatus therefor. SOLUTION: By using a coater provided with at least one coating film material supplying portion which supplies a coating film material, a flat-formed applying portion which discharges and applies the coating film material, and a transporting portion transporting the coating film material from the coating film material supplying portion to the applying portion, the coating film forming method applying the coating film material and its apparatus are provided. The above method in which the coating film material is a reaction-curable coating film material, is a preferable embodiment of this invention. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005046818(A) 申请公布日期 2005.02.24
申请号 JP20030284275 申请日期 2003.07.31
申请人 MAEDA ENGINEERING:KK;MITSUI KAGAKU SANSHI KK 发明人 MAEDA KAZUAKI;OGURA TETSUYOSHI;YAMADA YASUSHI
分类号 E01D19/08;B05C5/02;B05D1/26;E01D22/00;E04F21/08;(IPC1-7):B05D1/26 主分类号 E01D19/08
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