发明名称
摘要 A positive photosensitive composition comprising (A1) a compound that generates an alkanesulfonic acid in which the alpha-position is substituted with a fluorine atom upon irradiation of an actinic ray or radiation, (A2) an onium salt of an alkanesulfonic acid in which the alpha-position is not substituted with a fluorine atom, and (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase a solubility rate in an alkali developing solution.
申请公布号 JP3912767(B2) 申请公布日期 2007.05.09
申请号 JP20010188499 申请日期 2001.06.21
申请人 发明人
分类号 G03F7/039;G03F7/004;H01L21/027 主分类号 G03F7/039
代理机构 代理人
主权项
地址