发明名称 SURFACE COMPRISING A MICROSTRUCTURE THAT REDUCES ADHESION AND ASSOCIATED PRODUCTION METHOD
摘要 The invention relates to a surface comprising a microstructure that reduces adhesion and to a method for producing said microstructure. Microstructures of this type that reduce adhesion are known and are used, for example, to configure self-cleaning surfaces that us the Lotus effect. According to the invention, the surface is produced electrochemically by means of reverse pulse plating, the known microstructure being first produced and a nanostructure that is overlaid on the microstructure is produced at the same time or in a subsequent step. To achieve this for example, the pulse length of the current pulse that is used during the reverse pulse plating lies in the millisecond range and has a pulse length ratio greater than 1:3. The microstructure that has been produced, consisting of peaks and troughs is then overlaid with peaks and troughs of a smaller size order belonging to the nanostructure.
申请公布号 EP1781841(A1) 申请公布日期 2007.05.09
申请号 EP20050787076 申请日期 2005.08.08
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 HANSEN, CHRISTIAN;KRUEGER, URSUS;SCHNEIDER, MANUELA
分类号 C25D5/18 主分类号 C25D5/18
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