发明名称 FIELD-EFFECT TRANSISTOR
摘要 <p>The field-effect transistor includes: a ferromagnetic layer, having a film thickness of 50 nm or less, which is made of a Ba-Mn oxide showing ferromagnetism at 0 DEG C or higher; a dielectric layer made of a dielectric material or a ferroelectric material, and the ferromagnetic layer and the dielectric layer are bonded to each other. Thus, it is possible to control the magnetism, the electricity transport property, and/or the magnetic resistivity effect at 0 DEG C or higher. <IMAGE></p>
申请公布号 KR20070048811(A) 申请公布日期 2007.05.09
申请号 KR20077008619 申请日期 2007.04.16
申请人 JAPAN SCIENCE AND TECHNOLOGY AGENCY 发明人 TANAKA HIDEKAZU;KAWAI TOMOJI;KANKI TERUO;PARK, YOUNG GEUN
分类号 H01L29/772;H01L21/336;H01L29/49;H01L29/786;H01L29/82 主分类号 H01L29/772
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