| 摘要 |
<p>The invention is related to an apparatus for coating a substrate comprising an array of plasma arcs, a first plurality of reagent manifolds located upstream of the array of plasma arcs and a second plurality of reagent manifolds located downstream of the array of plasma arcs, each manifold having at least one orifice through which a reagent is ejected into a plasma jet issuing from a respective plasma arc, and a controller which provides rapid modulation of the flow of reagent to each manifold according to a specific protocol associated with the contours of the substrate and the substrate position relative to the plasma arcs and the manifolds, and to a method of coating a substrate with a reagent.</p> |
