| 摘要 |
A grating trim retarder (400) fabricated from a form-birefringent multi-layer dielectric stack (430,440;460) including at least one anti-reflection coating (421,423;461,462) and supported on a transparent substrate (490) is provided. The form-birefringent dielectric stack includes an axially-inhomogeneous element in the form of a -C-plate grating (450) and a transversely-inhomogeneous element in the form of an A-plate grating (410). Each of the -C-plate and the A-plate gratings are fabricated with dimensions such as to form a zeroth order sub-wavelength grating structure. Fabricating the grating trim retarder with anti-reflection coatings (421,423;461,462) and/or a segment where the -C-plate and A-plate grating overlap enables the in-plane and out-of-plane retardances to be tailored independently according to the desired application.
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