发明名称 |
PROCESS FOR MANUFACTURING AN EVAPORATION SOURCE |
摘要 |
13 The invention relates to a process for manufacturing an evaporation source f or physical vapour deposition. The evaporation source comprises the actual sputtering target with an aluminium component and one or more further components as wel l as a backing plate made from a material having better thermal conductivity than the target. According to the invention the backing plate made of a powdery starting material is pressed, together with the powdery components of the sputtering target, into sandwiched powder fractions and then formed. |
申请公布号 |
CA2375783(C) |
申请公布日期 |
2007.05.08 |
申请号 |
CA20012375783 |
申请日期 |
2001.11.07 |
申请人 |
PLANSEE AKTIENGESELLSCHAFT |
发明人 |
POLCIK, PETER;SCHONAUER, STEFAN;WILHARTITZ, PETER |
分类号 |
B22F3/17;C23C14/22;B22F3/14;B22F3/20;B22F7/06;C22C14/00;C23C14/34 |
主分类号 |
B22F3/17 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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