发明名称 PROCESS FOR MANUFACTURING AN EVAPORATION SOURCE
摘要 13 The invention relates to a process for manufacturing an evaporation source f or physical vapour deposition. The evaporation source comprises the actual sputtering target with an aluminium component and one or more further components as wel l as a backing plate made from a material having better thermal conductivity than the target. According to the invention the backing plate made of a powdery starting material is pressed, together with the powdery components of the sputtering target, into sandwiched powder fractions and then formed.
申请公布号 CA2375783(C) 申请公布日期 2007.05.08
申请号 CA20012375783 申请日期 2001.11.07
申请人 PLANSEE AKTIENGESELLSCHAFT 发明人 POLCIK, PETER;SCHONAUER, STEFAN;WILHARTITZ, PETER
分类号 B22F3/17;C23C14/22;B22F3/14;B22F3/20;B22F7/06;C22C14/00;C23C14/34 主分类号 B22F3/17
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