发明名称 Homojunction semiconductor devices with low barrier tunnel oxide contacts
摘要 A homojunction bipolar transistor with performance characteristics similar to more costly heterojunction or retrograde base transistors. The high emitter resistivity found in prior homojunction devices is circumvented using a low work function material layer in forming the emitter. This produces an economically viable high performance alternative to SiGe HBTs or SiGe retrograde base transistors.
申请公布号 US7214616(B2) 申请公布日期 2007.05.08
申请号 US20010795949 申请日期 2001.02.28
申请人 MICRON TECHNOLOGY, INC. 发明人 FORBES LEONARD;AHN KIE Y.
分类号 H01L21/44;H01L29/08 主分类号 H01L21/44
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