| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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| 申请公布号 |
US7213963(B2) |
申请公布日期 |
2007.05.08 |
| 申请号 |
US20040857614 |
申请日期 |
2004.06.01 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LOF JOERI;BIJLAART ERIK THEODORUS MARIA;RITSEMA ROELOF AEILKO SIEBRAND;VAN SCHAIK FRANK;SENGERS TIMOTHEUS FRANCISCUS;SIMON KLAUS;DE SMIT JOANNES THEODOOR;DEN BOEF ARIE JEFFREY MARIA;BUTLER HANS;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;VAN DE KERKHOF MARCUS ADRIANUS;KOLESNYCHENKO ALEKSEY YURIEVICH;KROON MARK;LOOPSTRA ERIK ROELOF;MEIJER HENDRICUS JOHANNES MARIA;MERTENS JEROEN JOHANNES SOPHIA MARIA;MULKENS JOHANNES CATHARINUS HUBERTUS;OTTENS JOOST JEROEN;STRAAIJER ALEXANDER;STREEFKERK BOB;VAN SANTEN HELMAR |
| 分类号 |
G03B27/42;G03B27/32;G03B27/72;G03B27/74;G03F7/20;H01L21/027 |
主分类号 |
G03B27/42 |
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