发明名称 GROWTH OF NITRIDE SEMICONDUCTOR CRYSTALS
摘要 A process for growing a crystal of a nitride semiconductor in which after the step of mounting a substrate (12) in a reaction tube (11), the step of feeding a first material gas containing a Group 3 element onto the substrate in the reaction tube and the step of feeding a second material gas containing elemental nitrogen onto the substrate in the reaction tube are carried out alternately to deposit a nitride semiconductor crystal directly on the substrate. The number of moles of the elemental nitrogen contained in the second material gas has a ratio of 200 or more to the number of moles of the Group 3 element in the first material gas.
申请公布号 KR20070048274(A) 申请公布日期 2007.05.08
申请号 KR20077007507 申请日期 2007.03.30
申请人 HONDA MOTOR CO., LTD.;KAWANISHI HIDEO 发明人 HASHIMOTO HIDEKI;HORIUCHI AKIHIKO;KAWANISHI HIDEO
分类号 H01L21/205 主分类号 H01L21/205
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