发明名称 Charged particle beam apparatus and dimension measuring method
摘要 There is provided a charged particle beam apparatus which allows implementation of a high-reliability and high-accuracy dimension measurement even if height differences exist on the surface of a sample. The charged particle beam apparatus includes the following configuration components: An acquisition unit for acquiring a plurality of SEM images whose focus widths are varied in correspondence with the focal depths, a determination unit for determining, from the plurality of SEM images acquired, a SEM image for which the image sharpness degree of the partial domain including a dimension-measuring domain becomes the maximum value, and a measurement unit for measuring the dimension of the predetermined domain from the SEM image whose image sharpness degree is the maximum value.
申请公布号 US7214936(B2) 申请公布日期 2007.05.08
申请号 US20050242129 申请日期 2005.10.04
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 SATO MITSUGU;SAKAI KATSUHIKO;TAKANE ATSUSHI;NAKAYAMA YOSHIHIKO
分类号 H01J37/21 主分类号 H01J37/21
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