METHOD FOR FORMING GATE INSULATING FILM, SEMICONDUCTOR DEVICE AND COMPUTER RECORDING MEDIUM,申请号KR20077002817-传众专利搜索

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发明名称	METHOD FOR FORMING GATE INSULATING FILM, SEMICONDUCTOR DEVICE AND COMPUTER RECORDING MEDIUM
摘要
申请公布号	KR20070047773(A)	申请公布日期	2007.05.07
申请号	KR20077002817	申请日期	2007.02.05
申请人	TOKYO ELECTRON LIMITED	发明人	NISHITA TATSUO;ISHIZUKA SHUUICHI;FUJINO YUTAKA;NAKANISHI TOSHIO;SATO YOSHIHIRO
分类号	H01L21/316;H01L21/02	主分类号	H01L21/316
代理机构		代理人
主权项
地址

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