METHOD OF FORMING A GATE STACK AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME,申请号KR20050104087-传众专利搜索

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发明名称	METHOD OF FORMING A GATE STACK AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME
摘要
申请公布号	KR20070047399(A)	申请公布日期	2007.05.07
申请号	KR20050104087	申请日期	2005.11.02
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	PARK, JAE HWA;KIM, BYUNG HEE;PARK, HEE SOOK;LEE, JANG HEE
分类号	H01L21/283	主分类号	H01L21/283
代理机构		代理人
主权项
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