发明名称 Exposure apparatus with laser device
摘要 A laser apparatus that includes a laser light generation section, an optical amplification section, a wavelength conversion section and a suppressing section is provided. The laser light generation section includes a single wavelength oscillatory laser and generates pulsed light having a single wavelength within a wavelength range ranging from about 1.51 to 1.59 mum. The optical amplification section includes an optical fiber amplifier and is optically connected to the laser light generation section to amplify the pulsed light. The wavelength conversion section includes a nonlinear optical crystal and is optically connected to the optical amplification section to perform wavelength conversion of the amplified pulsed light into ultraviolet light. The suppressing section suppresses expansion of a wavelength width of light originated in a nonlinear effect of an optical element between the single wavelength oscillatory laser and the wavelength conversion section.
申请公布号 US7212275(B2) 申请公布日期 2007.05.01
申请号 US20050111828 申请日期 2005.04.22
申请人 NIKON CORPORATION 发明人 OHTSUKI TOMOKO
分类号 G03B27/54;G02F1/35;G03B27/72;G03F7/20;G03F9/00;H01S3/00;H01S3/067;H01S3/094;H01S3/109;H01S3/131;H01S3/16 主分类号 G03B27/54
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