发明名称 A SYSTEM AND METHOD FOR CLEANING A CONDITIONING DEVICE
摘要 <p>A system for cleaning a conditioning device to improve the efficiency of the conditioning of a polishing pad using the conditioning device as part of a chemical-mechanical polishing process, the system comprising a conditioning device; a fluid dispenser arranged to dispense a fluid on the conditioning device; and an acoustic nozzle arranged to emit a megasonic or ultrasonic signal at the conditioning device while the fluid dispenser is dispensing the fluid on the conditioning device.</p>
申请公布号 WO2007045267(A1) 申请公布日期 2007.04.26
申请号 WO2005EP12343 申请日期 2005.10.19
申请人 FREESCALE SEMICONDUCTOR, INC.;STMICROELECTRONICS (CROLLES 2) SAS;STMICROELECTRONICS SRL;LAFON, JEAN-MARC;DELMONACO, SILVIO;PETITDIDIER, SEBASTIEN 发明人 LAFON, JEAN-MARC;DELMONACO, SILVIO;PETITDIDIER, SEBASTIEN
分类号 B24B1/04;B24B49/10;B24B49/18;B24B53/007;B24B53/017 主分类号 B24B1/04
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