发明名称 MASK AND INSPECTION METHOD THEREOF
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a mask and its inspection method capable of performing destructive inspection without preparing an inspection mask and capable of more accurately performing non-destructive inspection. <P>SOLUTION: A mask comprises a membrane 2 for exposure which has transmission portions of exposure beams and non-transmission portions at a prescribed pattern, a thick film part 3 formed around the membrane 2 for exposure and capable of supporting the membrane 2 for exposure and a membrane 4 for inspection which has transmission portions and non-transmission portions, has an area larger than that of the membrane 2 for exposure, has distortion larger than that of the membrane 2 for exposure, and formed on a part of the thick film part 3 so as to be separated from the membrane 2 for exposure. Inspection is performed by using the membrane 4 for inspection. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007110154(A) 申请公布日期 2007.04.26
申请号 JP20060340398 申请日期 2006.12.18
申请人 SONY CORP 发明人 YOSHIZAWA MASAKI;WATANABE YOKO;OMORI SHINJI;IWASE KAZUYA;AMAI KEIKO
分类号 H01L21/027;G03F1/00;G03F1/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址