| 摘要 |
A display device capable of implementing a high resolution and a method of fabricating the same. The display device includes a substrate, a silicon member, an electron emission member, and a phosphor layer. The silicon member is attached to the substrate. The silicon member has a groove formed on at least a portion of an inner surface of the silicon member and forms a light-emitting space in cooperation with the substrate. The groove can be formed by chemical etch or deep reactive ion etching (DRIE) of a silicon wafer or a silicon on insulator (SOI) wafer. The electron emission member is disposed on a portion of the groove. The phosphor layer is disposed in the light-emitting space. The display device may further have an anode electrode disposed on the substrate. Such a display device is versatile and simple in structure and fabrication.
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