发明名称 |
METHOD OF MANUFACTURING SEMICONDUCTOR LENS |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing semiconductor lens capable of easily forming a semiconductor lens having an arbitrary shape. SOLUTION: The method of manufacturing the semiconductor lens 1 (Fig. 1(f)) comprising a silicon lens made by removing part of a semiconductor substrate 10 (Fig. 1(a)) made of p-type silicon substrate comprises: an anode forming step of forming an anode 12 (Fig. 1(c)) by pattern design in accordance with a desired lens shape; an anodizing step of forming a porous part 14 (Fig. 1(e)) made of porous silicon as a removal part on the other surface side of the semiconductor substrate 10 by supplying power between a cathode oppositely arranged on the other surface side of the semiconductor substrate 10 and the anode 12 in an electrolytic solution; and a porous part removing step of removing a porous part 14, wherein an insulation film 15 is formed on the other surface side of the semiconductor substrate 10 before anodizing step by the pattern design in accordance with the lens shape (Fig. 1(d)). COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2007108777(A) |
申请公布日期 |
2007.04.26 |
申请号 |
JP20060334970 |
申请日期 |
2006.12.12 |
申请人 |
MATSUSHITA ELECTRIC WORKS LTD |
发明人 |
HONDA YOSHIAKI;NISHIKAWA NAOYUKI;UETSU TOMOHIRO |
分类号 |
G02B3/00;G02B1/02 |
主分类号 |
G02B3/00 |
代理机构 |
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