INTERFEROMETRIC ANALYSIS FOR THE MANUFACTURE OF NANO-SCALE DEVICES

摘要

The present invention features a system and method to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. To that end, relative alignment between the two coordinate systems at multiple points is sensed to determine relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape.