发明名称 Apparatus and method for recovering liquid droplets in immersion lithography
摘要 Immersion fluid remaining on a portion of a substrate after that portion has passed an immersion nozzle is removed by moving the substrate relative to an immersion nozzle so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle again. A path is determined along which the substrate is to be moved to remove the remaining immersion fluid. The path can be determined based upon previous movements of the substrate, including factors such as the speed and/or length of the previous movements. Alternatively, portions of the substrate on which immersion fluid remains can be detected, and then the substrate can be moved so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle based on the results of the detection. Immersion fluid also can be removed from the stage surface located beyond the substrate.
申请公布号 US2007091289(A1) 申请公布日期 2007.04.26
申请号 US20060583069 申请日期 2006.10.19
申请人 NIKON CORPORATION 发明人 POON ALEX K.T.;KHO LEONARD W.F.;KESWANI GAURAV
分类号 G03B27/42 主分类号 G03B27/42
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