发明名称 CONTACT ASSEMBLY CLEANING IN AN ELECTRO-CHEMICAL MECHANICAL PROCESSING APPARATUS
摘要 <p>Embodiments of the invention generally provide a method and apparatus for cleaning an electrical contact in an electrochemical mechanical planarizing apparatus. In one embodiment, a method for cleaning a contact assembly in an electroprocessing apparatus includes the steps of draining electrolyte from the contact assembly and flowing a rinsing fluid into the contact assembly. In another embodiment, a method for cleaning a contact assembly in an electroprocessing apparatus includes the steps of preventing fluid from passing between an interface of the contact assembly and a pad disposed outward thereof, flowing a rinsing fluid into the contact assembly and draining fluid flowing out of the contact assembly.</p>
申请公布号 WO2007047215(A2) 申请公布日期 2007.04.26
申请号 WO2006US39439 申请日期 2006.10.10
申请人 APPLIED MATERIALS, INC.;MANENS, ANTOINE, P.;DUBOUST, ALAIN;BUTTERFIELD, PAUL, D.;MARTINEZ, RICARDO;WANG, YAN;SALAS-VERNIS, JOSE 发明人 MANENS, ANTOINE, P.;DUBOUST, ALAIN;BUTTERFIELD, PAUL, D.;MARTINEZ, RICARDO;WANG, YAN;SALAS-VERNIS, JOSE
分类号 C25D21/06 主分类号 C25D21/06
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