| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an atmospheric pressure plasma treatment device capable of uniformizing the concentration of plasma gas flowing on a work surface while suppressing the flow rate of process gas. <P>SOLUTION: The atmospheric pressure plasma treatment device 1, in which a parallel flat plate discharge space 8 is constituted between an upper cover 2 on an upper electrode 6 side and a table 4 on a lower electrode side on which a work W is placed, and plasma treatment is applied to the surface of the work W while process gas flows through the discharge space 8, includes an inflow gas straightening means 9 connected to the inflow end of the discharge space 8 and straightening inflow plasma gas to become uniform flow rate in the width direction and an outflow gas straightening means 10 connected to the outflow end of the discharge space 8 and straightening outflow plasma gas to become uniform flow rate in the width direction. <P>COPYRIGHT: (C)2007,JPO&INPIT |
