| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing device generating plasma by microwave, improving uniformity of plasma density at plasma processing. <P>SOLUTION: A quartz glass plate 22 as a dielectric is airtightly arranged at an upper opening of a processing container, and a bottom face of a bump 24 electrically connected to an inside conductor 25a of a coaxial wave guide 25 is located at the central part of a bottom face of the quartz glass plate 22. Microwave is not emitted from the central part of the bottom face of the quartz glass plate 22, and emission from a neighboring area of convex parts 31, 32 become more active than that from other areas. As a result, plasma characteristics having low density at the central part can be obtained. <P>COPYRIGHT: (C)2007,JPO&INPIT |
