发明名称 METHOD FOR REMOVING THIN FILM OF ELECTROCONDUCTIVE METAL OXIDE, AND APPARATUS THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a method for removing a thin film of an electroconductive metal oxide without leaving a scratch or deformation by stress, and an apparatus therefor. SOLUTION: This removing method is for removing the thin film 12 of the electroconductive metal oxide formed on the surface of a substrate 11 by the steps of: arranging a positive electrode 13 and a negative electrode 14 above the thin film 12; and applying voltage between both of the electrodes 13 and 14 to reduce the metal oxide, while supplying an electrolytic solution 17 among the electroconductive film 12, the positive electrode 13 and the negative electrode 14. A positive electrode 13 covered with a polymer electrolyte 15 is used for the positive electrode 13. Thereby, the thin film of the electroconductive metal oxide even in the end of the substrate can be efficiently removed without forming scratch or deformation by stress, and an expensive functional glass substrate or the like can be recycled. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007107054(A) 申请公布日期 2007.04.26
申请号 JP20050299283 申请日期 2005.10.13
申请人 HITACHI ZOSEN CORP 发明人 INOUE TETSUYA;DAIKU HIROYUKI;KAMIKAWA KENJI
分类号 C25F1/00;C25F7/00 主分类号 C25F1/00
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