发明名称 |
IMMERSION LITHOGRAPHY APPARATUS AND METHODS |
摘要 |
A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; and a cleaning module adapted to clean the lithography apparatus. The cleaning module is selected from the group consisting of an ultrasonic unit, a scrubber, a fluid jet, an electrostatic cleaner, and combinations thereof.
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申请公布号 |
US2007091287(A1) |
申请公布日期 |
2007.04.26 |
申请号 |
US20060427421 |
申请日期 |
2006.06.29 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
CHANG CHING-YU;LIN BURN JENG;LIN CHIN-HSIANG |
分类号 |
B08B3/12;B08B3/00;B08B7/00;G03B27/52 |
主分类号 |
B08B3/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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