发明名称 Beam modifying device, lithographic projection apparatus, method of treating a beam, and device manufacturing method
摘要 A beam modifying device configured to receive an input radiation beam along a first optical axis, and configured to emit an output radiation beam along a second optical axis. The beam modifying device includes a divider disposed along the first optical axis and configured to divide the incoming radiation beam into a first part and a second part, the divider being configured to direct the first part along the second optical axis and to direct the second part via a delay path. The beam modifying device further includes optics forming the delay path, the optics being configured to receive the second part and to direct the second part via the delay path and then along the second optical axis. The optics are arranged to mirror the second part such that the second part is mirrored with respect to the first part.
申请公布号 US2007090278(A1) 申请公布日期 2007.04.26
申请号 US20050203413 申请日期 2005.08.15
申请人 ASML NETHERLANDS B.V. 发明人 BOTMA HAKO
分类号 H01J5/16;H01J3/14 主分类号 H01J5/16
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