发明名称 METHOD AND DEVICE FOR LASER ANNEALING
摘要 <p><P>PROBLEM TO BE SOLVED: To realize easy laser annealing operation and a simple constitution of a laser anneal device. <P>SOLUTION: Pure water is sprayed in a W-shaped liquid column from a spray nozzle provided to a processing head 6 to a work piece 2 formed by laminating an amorphous semiconductor film on a substrate 2a, and a laser light L is subjected to light guiding into the W-shaped liquid column. Since the inside of the liquid column W is irradiated with the guided laser light L, the amorphous silicon film 2b is crystallized into a polysilicon film, and in the process, pure water of the liquid column W spreads along the amorphous silicon film 2b, thus covering a portion irradiated with the laser light L with the pure water and preventing it from coming into contact with air. Furthermore, a portion heated by the laser light L is rapidly cooled by the pure water of the liquid column W, and the crystal grain of the crystallized polysilicon can be enlarged. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007109943(A) 申请公布日期 2007.04.26
申请号 JP20050300230 申请日期 2005.10.14
申请人 SHIBUYA KOGYO CO LTD 发明人 SASAKI MOTOI;KOSEKI RYOJI
分类号 H01L21/20;B23K26/00;B23K26/08;B23K26/14;H01L21/268 主分类号 H01L21/20
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