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发明名称
Höhlungvermeidender Reaktor und Verfahren zur Herstellung eines Halbzeuges für optische Fasern in einem solchen Reaktor
摘要
申请公布号
DE60215079(T2)
申请公布日期
2007.04.26
申请号
DE20026015079T
申请日期
2002.06.05
申请人
SAMSUNG ELECTRONICS CO. LTD.
发明人
CHO, HAN SOL;HWANG, JIN TAEK;CHOI, JIN SUNG;CHO, SUNG HEN
分类号
B29C37/00;G02B6/00;B29C31/04;B29C33/00;B29C35/08;B29C39/08;B29C39/24;B29C41/04;B29D11/00;C08F2/01;C08F2/44;C08F291/00
主分类号
B29C37/00
代理机构
代理人
主权项
地址
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