发明名称 Electroless plating apparatus and electroless plating method
摘要 An electroless plating apparatus can form a protective film on exposed surfaces of embedded interconnects stably with good selectivity for thereby protecting the interconnects. The electroless plating apparatus includes a magnetic removal portion for magnetically removing small magnetic suspended solids in an electroless plating solution which have not been removed by a filter.
申请公布号 US2007092658(A1) 申请公布日期 2007.04.26
申请号 US20060585957 申请日期 2006.10.25
申请人 OWATARI AKIRA;SAIJO YASUHIKO;TSUJINO JUNICHIRO 发明人 OWATARI AKIRA;SAIJO YASUHIKO;TSUJINO JUNICHIRO
分类号 B05D3/00;B05C3/00;B05D1/18;B05D3/12 主分类号 B05D3/00
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