| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which is used in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, and which improves development defect performance and mask error factor even in the formation of a fine pattern of ≤100 nm, and a pattern forming method using the same. <P>SOLUTION: The positive photosensitive composition comprises (A) a resin which has a repeating unit having a diamantane structure and decomposes by the action of an acid to increase solubility in an alkali developer, (B) a compound capable of generating a specific organic acid upon irradiation with an actinic ray or radiation and (C) a solvent. The pattern forming method using the same is also provided. <P>COPYRIGHT: (C)2007,JPO&INPIT |
