| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition having high sensitivity, excellent resolution and very high temporal stability of sensitivity and capable of efficiently forming patterns such as a wiring pattern and a solder resist pattern with high definition, to provide a pattern forming material and a photosensitive laminate having a photosensitive layer formed of the photosensitive composition, and to provide a pattern forming apparatus and a pattern forming method. <P>SOLUTION: The photosensitive composition contains at least a binder, a polymerizable compound and a photopolymerization initiation compound, wherein the photosensitive composition contains a compound having a di-substituted amino-benzene as a partial structure and an oxime derivative as the photopolymerization initiation compound. There are also provided the pattern forming material and the photosensitive laminate having a photosensitive layer formed of the photosensitive composition, the pattern forming apparatus equipped with the photosensitive laminate and the pattern forming method. <P>COPYRIGHT: (C)2007,JPO&INPIT |
