ESTER GROUP-CONTAINING POLY(IMIDE-AZOMETHINE) COPOLYMER, ESTER GROUP-CONTAINING POLY(AMIDE ACID-AZOMETHINE) COPOLYMER, AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide: an ester group-containing poly(imide-azomethine) copolymer having a low linear thermal expansion coefficient; a production method thereof; an ester group-containing poly(amide acid-azomethine) copolymer to serve as the precursor of the above copolymer; a positive photosensitive composition consisting of the precursor copolymer and a photosensitizer; a fine pattern manufacturing method to obtain the fine pattern of the ester group-containing poly(imide-azomethine) copolymer from this composition; and a fine pattern manufacturing method to obtain the fine pattern by etching by an alkali a photosensitizer-free, ester group-containing poly(imide-azomethine) copolymer.

SOLUTION: The ester group-containing poly(imide-azomethine) copolymer consists of the ester group-containing azomethine polymeric unit of formula (1) and the imide polymeric unit of formula (2) (wherein D contains an ester group).

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